The Institute has more than 20,000 square feet of cleanroom and laboratory resources dedicated to the realization of a broad range of micro/nanoscale systems. The Institute provides services to external customers on many aspects of processing needs, which are tailored to maximally meet the customers’ specifications. A partial listing of available services follows, and a complete listing is available upon request.
Lithographic Processes and Masks Processes are available for photolithography. Masks for photolithography are provided to meet customer applications.
Material Deposition Processes A range of processes are available for deposition of various thin film materials including, e-beam evaporation, sputtering, and electro/electroless plating.
Nano-Assembly Processes Processes for the realization of nanoscale thin film materials are available including a layer by layer assembly processes, for which the Institute has pioneered many aspects of its development and application.
Material Etching Processes Dry and wet etching processes including deep & conventional reactive ion etching are available to meet customer needs.